Probenvorbereitung
| Device | Name | Manufacturer | Specification |
| Autoclaves | Parr | Teflon inlet, 40 ml | |
| Benchtop centrifuge | Universal 320 | Hettich | 15000 rpm, 6 sample ports |
| Benchtop centrifuge with cooling/ temp regulation | Centrifuge 5810 R | Eppendorf | 14000 rpm, 6 sample ports |
| Capillary Boy | Huber Diffraktionstechnik | Filling capillaries | |
| Conditioning Mixer | ARE-250 | Thinky | 300 °C, 300 W, 21 Bar |
| Dosing unit | Nordson | ||
|
Exicator storage for air sensitv samples |
Under pressure – 10 mbar |
||
|
Eppendorf pipette 11x |
Eppendorf |
10 µl, 100 µl, 1000 µl and 10000 µl |
|
| Gas mixing device | Mass Flow Controller, Gassensor | ||
Hot plate with stirrer 3x |
VWR | ||
| Laboratory press | MP 150 | Massen GmbH | 0 – 292 bar |
| LED light sources | ʎ: 375 nm, 385 nm and 535 nm | ||
| Magnetic stirrer 4x | IKA | 3000 rpm | |
| Microwave oven | Discover | CEM | |
| Mini Lamp Annealing System | MILA 3000 | ULVAC-RIKO | Temperature range room temperature to 800 °C, atmosphere: air, inertgas, heating rate 4° C/s |
| Multiple laboratory power supply | multiple | multiple | |
| Oven 4x | Memmert | 300 °C | |
| Oven | Hereaus | Thermo scientific | 270 °C |
| Oven | Hereaus | Hereaus | |
| PEC cell | PECC-2 | Zahner Elektric | Optical working area of 0.5 cm2. Pt counter electrode, and Ag/AgCl (3M NaCl) or Hg/HgO (1M NaOH) reference electrodes gas inlet and outlet to be connected to a gas-chromatograph for hydrogen quantification |
| Plasma cleaner | Diener | P: 200 W, emits UV-light down to 200 nm, also visible light and IR-light. IR-light is filtered through water | |
| Mercury/Xenon Archlamp | Newport | P: 200 W, emits UV-light down to 200 nm, also visible light and IR-light. IR-light is filtered through water | |
| Rotatory evaporator with chiller | Heidolph | Water bath 90-100 °C, vac pump -1 mbar chiller – 4 °C | |
| Spin Coater | SPS | Speed 0 – 10000 rpm. Acceleration 0 – 2000 rpm/s | |
| Solar Simulator | Lumixo-S | Lumatrix | Plasma lamp electrode-less light source powered by radio frequencies. ʎ: 280 nm to 3000 nm. P: 500 to 1150 W. |
| Sputter Coater | ACE600 | Leica | Sputtering: Gold, Titanium and Chromium. Evaporation: Carbon |
| Supercritical dryer | E3000 | Quorum Technologies | Specimen chamber 32 mm x 75 mm. Working pressure 83 Bar. Drying medium CO2 |
| Tube furnace 2x | Carbolite | Tmax 1200 °C | |
| Ultrasonic cleaner | Bandelin Sonorex | Bandelin electronic | Frequency 35 kHz |
| Ultrasonic processor | UP400St | Hielscher | 24 kHz |
| UV cleaning | ZONESEM II | Sonyu Co. Ltd. | |
| Vortex shaker | Vortex 2 | IKA | 500 – 2500 rpm |
| 3D Printer | Ultimaker 2+ | Ultimaker | Material: PLA white, black and silver metallic PET-G white Nylon Polyamide transparent PP Natural PAHT CF15 CPE+ Black |
| 3D Printer | Hyrel | Direkt ink writing, extrusion-based additive manufacturing, Nozzle diameter 0,1 – 1,6 mm | |
| Glovebox | M. BRAUN | 4 gloves Argon atmosphere +/- 10 mbar difference pressure |
|
| Glovebox | GS MEGA E-Line |
GS GLOVEBOX | 2 gloves N2 atmosphere +/- 10 mbar difference pressure Oven up to 250 °C |
| Fume Hood 4x | Waldner |